Dicobalt Octacarbonyl (stabilized with 1-5% Hexane) (95+%-Co)

Applications for Dicobalt Octacarbonyl

Dicobalt Octacarbonyl is a precursor used for depositing cobalt films and cobalt-containing films, such as cobalt, cobalt nitride, cobalt oxide, etc. Dicobalt octacarbonyl (CAS Number 10210-68-1) is used for atomic layer deposition by the semiconductor and related industries.

Surfaces for such deposition can include metals, metal nitrides, metal silicides, and metal oxides.

Dicobalt Octacarbonyl is valued for it ability to be a precursor for the selective deposition of cobalt-containing films onto on specific surfaces, enabling superior film performance in regards to continuity, uniformity, and low resistance.

In organometallic chemistry and organic synthesis, Dicobalt octacarbonyl is a reagent and catalyst used for hydroformylation: the conversion of alkenes into aldehydes. Dicobalt octacarbonyl is highly reactive towards alkynes, so it is sometimes used as an alkyne-protecting compound.

Ereztech’s Experience with Dicobalt Octacarbonyl

Ereztech is a High Volume Manufacturer (HVM) of Dicobalt Octacarbonyl (CAS Number 10210-68-1), with an annual capacity exceeding three metric tons.

Ereztech as Your Custom Developer of Dicobalt Octacarbonyl

Dicobalt octacarbonyl is typically available for shipment from Ereztech within 2 weeks, and it is often in stock for immediate shipping.

Ereztech eagerly welcomes requests for customized organometallic formulations; for example, higher purity levels, different forms (e.g., solid, powder, or liquid, where applicable), and custom packaging.

To accelerate your custom metal-organics development, we offer our exclusive Ereztech 25 grams™ program. We’ll synthesize your new molecule for a minimum as small as 25g, at our cost. It’s low risk with big potential upsides: you achieve your ideal precursor faster, fully protected by NDAs and all steps necessary to ensure your long-term success as we scale up.

Recent Application Research for Dicobalt Octacarbonyl

©2018 Ereztech LLC. | All rights reserved. | All trademarks are property of their respective owners.