Tris(diethylamido)(tert-butylimido)niobium(V)
Synonym: (tert)
CAS Number 210363-27-2 | MDL Number MFCD16659983 | EC Number 693-781-8
Tris(diethylamido)(tert-butylimido)niobium(V) is used as a niobium precursor by both thermal atomic layer deposition (ALD) and plasma-enhanced atomic layer deposition (PE-ALD) with H2O and O2 plasma as co-reactants, respectively. See links below
Ereztech manufactures and sells this product in small and bulk volumes. Glass ampules, bottles or metal ampules or bubblers are available for packaging. For additional analytical information or details about purchasing NB3272 contact us at sales@ereztech.com
Safety information
UN | 3399 |
Hazardous class | 4.3(3) |
Packing group | II |
Pictograms | |
Signal word | DANGER |
Hazard statements | H225-H261-H319-H335 |
Precautionary statements | P210-P223-P231 + P232-P233-P240-P241-P242-P243-P261-P264-P271-P280-P303 + P361 + P353-P304 + P340-P305 + P351 + P338-P312-P334 + P335-P337 + P313-P370 + P378 |
Transport description | Organometallic substance, liquid, water-reactive, flammable (Tris(diethylamido)(tert-butylimido)niobium(V)) |
In TSCA registry | No (research and development usage only) |
First Aid Measures
General advice | Consult a physician. Show this safety data sheet to the doctor in attendance. Move out of the dangerous area. |
Eye contact | Rinse thoroughly with plenty of water for at least 15 minutes and consult a physician. |
Skin contact | Wash off with soap and plenty of water. Consult a physician. |
Inhalation | If breathed in, move person into the fresh air. If not breathing, give artificial respiration. Consult a physician. |
If swallowed | Do NOT induce vomiting. Never give anything by mouth to an unconscious person. Rinse mouth with water. Consult a physician. |
Certificates of Analysis (CoA)
If you don’t see the needed lot of Tris(diethylamido)(tert-butylimido)niobium(V) below please contact customer support at sales@ereztech.com
External identifiers for TBTDEN
Pubchem CID | 87431252 |
IUPAC Name | tert-butyliminoniobium; diethylazanide |
SMILES | CC[N-]CC.CC[N-]CC.CC[N-]CC.CC(C)(C)N=[Nb] |
InchI Identifier | InChI=1S/C4H9N.3C4H10N.Nb/c1-4(2,3)5;3*1-3-5-4-2;/h1-3H3;3*3-4H2,1-2H3;/q;3*-1; |
InchI Key | XEMGCFWEYRQHLX-UHFFFAOYSA-N |
Known applications and external links
- Saravana Balaji Basuvalingam, Bart Macco Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films. Journal of Vacuum Science & Technology A 36, 041503 (2018)
- P. Pizzol, J. W. Roberts, J. Wrench, O.B. Malyshev, R. Valizadeh, P. R. Chalker ATOMIC LAYER DEPOSITION OF NIOBIUM NITRIDE FROM DIFFERENT PRECURSORS
- Eric Degunsa, Mark J. Sowab, Mark J. Dalberthb, Ritwik Bhatiab, Ravi Kanjoliac, Dan Moserc, Ganesh M. Sundaramd, Jill S. Beckere Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
With Tris(diethylamido)(tert-butylimido)niobium(V) oxide other customers often ask:
- Niobium(V) ethoxide
- Niobium tetraethoxy dimethylaminoethoxide
- Bis(cyclopentadienyl)niobium(IV) dichloride
- Pentakis(dimethylamino)niobium
Ereztech synthesizes and sells additional NB-compounds.
To purchase NB3272 contact us at sales@ereztech.com