Microelectromechanical systems (MEMS) and Nanomaterial structures utilize structural materials that are often coupled to electrical or mechanical outputs that comprise sensors, actuators, micro-machine elements important in sophisticated devices in automotive, medical, industrial and many other sophisticated instruments and tools in our world. Materials to create micro and nano-scaled cantilevers, hinges, transducers are created utilizing thin film ALD/CVD precursors for deposition as well as condensed phase formulations for spin-on deposition processes. The mechanical components rely on silicon and silicon oxide/nitrides/carbides, germanium, diamond, aluminum oxide to mention more common materials. Precursors for these films are well represented in the catalogue along with the many other metal precursors semiconductor and dielectric components. This pallet of materials provides the necessary range of properties to support advanced application development.
Most frequently, our customers are interested in the following compounds for these types of applications: Lanthanum (III) Nitrate, Hydrate, Neodymium Nitrate Hexahydrate, Bis-(t-butylamino)silane, Bis(cyclopentadienyl)ruthenium, Ruthenocene, Cp2Ru, (C5H5)2Ru, Titanium(IV) diisopropoxidebis(2,2,6,6-tetramethyl-3,5-heptanedionate), Molybdenum hexacarbonyl, Dicobalt Octacarbonyl (stabilised with 1-5% Hexane), Iron(II) acetylacetonate, Bis[bis(trimethylsilyl)amino]tin(II).
Please check out our extensive offering in metal, dielectric and semiconductor precursors. We welcome the opportunity to accelerate your development agenda.