Tris(diethylamido)(tert-butylimido)niobium(V)
Synonym: (tert)
CAS Number 210363-27-2 | MDL Number MFCD16659983 | EC Number 693-781-8
Tris(diethylamido)(tert-butylimido)niobium(V), also known as TBTDEN or (tert)-Butyliminotris(diethylamino)niobium, is an organoniobium compound with the molecular formula C₁₆H₃₉N₄Nb and a molecular weight of 380.41 g/mol. This compound features niobium in a +5 oxidation state, coordinated with three diethylamido ligands and a single tert-butylimido group. It appears as a yellow to brown liquid with a purity of 98%+, confirmed by gravimetric assay, and has a niobium content ranging from 23.8-24.8%. The compound is highly sensitive to air and moisture, requiring storage in an inert atmosphere.
Applications in Organic and Inorganic Synthesis
Tris(diethylamido)(tert-butylimido)niobium(V) is commonly utilized as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes. Its combination of diethylamido and tert-butylimido ligands enables controlled nitrogen incorporation, essential for the creation of niobium nitride films in advanced electronic applications. This compound is especially valuable in developing high-performance coatings and materials, where niobium’s unique properties enhance the durability and functionality of the resulting films, particularly in microelectronics and semiconductor technologies.
Precautions for Safe Storage and Handling
With hazard codes H225, H261-2, H319, and H335, Tris(diethylamido)(tert-butylimido)niobium(V) is flammable and water-reactive, posing risks of eye irritation and respiratory discomfort. Protective equipment, such as gloves, goggles, and flame-resistant clothing, is recommended during handling. The compound should be stored in a moisture-free environment under an inert gas, such as nitrogen or argon, to avoid unwanted reactions. Its sensitivity to air necessitates careful handling to prevent degradation or accidental ignition.
Industrial and Laboratory Applications
In industrial and laboratory environments, Tris(diethylamido)(tert-butylimido)niobium(V) is crucial for the production of thin films and niobium-based coatings. Its high purity and controlled reactivity make it indispensable in ALD and CVD applications, where it aids in creating uniform, high-quality layers essential for semiconductor manufacturing. The compound’s stability and ability to form precise coatings make it a preferred choice for advanced material development, supporting both research and commercial processes in high-tech sectors.
Tris(diethylamido)(tert-butylimido)niobium(V) is used as a niobium precursor by both thermal atomic layer deposition (ALD) and plasma-enhanced atomic layer deposition (PE-ALD) with H2O and O2 plasma as co-reactants, respectively. See links below
Ereztech manufactures and sells this product in small and bulk volumes. Glass ampules, bottles or metal ampules or bubblers are available for packaging. For additional analytical information or details about purchasing NB3272 contact us at sales@ereztech.com
Safety information
| UN | 3399 |
| Hazardous class | 4.3(3) |
| Packing group | II |
| Pictograms |   |
| Signal word | DANGER |
| Hazard statements | H225-H261-H319-H335 |
| Precautionary statements | P210-P223-P231 + P232-P233-P240-P241-P242-P243-P261-P264-P271-P280-P303 + P361 + P353-P304 + P340-P305 + P351 + P338-P312-P334 + P335-P337 + P313-P370 + P378 |
| Transport description | Organometallic substance, liquid, water-reactive, flammable (Tris(diethylamido)(tert-butylimido)niobium(V)) |
| In TSCA registry | No (research and development usage only) |
First Aid Measures
| General advice | Consult a physician. Show this safety data sheet to the doctor in attendance. Move out of the dangerous area. |
| Eye contact | Rinse thoroughly with plenty of water for at least 15 minutes and consult a physician. |
| Skin contact | Wash off with soap and plenty of water. Consult a physician. |
| Inhalation | If breathed in, move person into the fresh air. If not breathing, give artificial respiration. Consult a physician. |
| If swallowed | Do NOT induce vomiting. Never give anything by mouth to an unconscious person. Rinse mouth with water. Consult a physician. |
Certificates of Analysis (CoA)
If you don’t see the needed lot of Tris(diethylamido)(tert-butylimido)niobium(V) below please contact customer support at sales@ereztech.com
External identifiers for TBTDEN
| Pubchem CID | 87431252 |
| IUPAC Name | tert-butyliminoniobium; diethylazanide |
| SMILES | CC[N-]CC.CC[N-]CC.CC[N-]CC.CC(C)(C)N=[Nb] |
| InchI Identifier | InChI=1S/C4H9N.3C4H10N.Nb/c1-4(2,3)5;3*1-3-5-4-2;/h1-3H3;3*3-4H2,1-2H3;/q;3*-1; |
| InchI Key | XEMGCFWEYRQHLX-UHFFFAOYSA-N |
Known applications and external links
- Saravana Balaji Basuvalingam, Bart Macco Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films. Journal of Vacuum Science & Technology A 36, 041503 (2018)
- P. Pizzol, J. W. Roberts, J. Wrench, O.B. Malyshev, R. Valizadeh, P. R. Chalker ATOMIC LAYER DEPOSITION OF NIOBIUM NITRIDE FROM DIFFERENT PRECURSORS
- Eric Degunsa, Mark J. Sowab, Mark J. Dalberthb, Ritwik Bhatiab, Ravi Kanjoliac, Dan Moserc, Ganesh M. Sundaramd, Jill S. Beckere Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
With Tris(diethylamido)(tert-butylimido)niobium(V) oxide other customers often ask:
- Niobium(V) ethoxide
- Niobium tetraethoxy dimethylaminoethoxide
- Bis(cyclopentadienyl)niobium(IV) dichloride
- Pentakis(dimethylamino)niobium
Ereztech synthesizes and sells additional NB-compounds.
To purchase NB3272 contact us at sales@ereztech.com
