Tris[N-N-bis(trimethylsilyl)amide]lanthanum(III)
Synonym: Lanthanum bis(trimethylsilyl)
CAS Number 35788-99-9 | MDL Number MFCD00271009 | EC Number 625-134-2
Tris[N,N-bis(trimethylsilyl)amide]lanthanum, also known as Lanthanum tris(bis(trimethylsilyl)amide) or La[N(TMS)₂]₃, is an organolanthanum compound with the molecular formula C₁₈H₅₄N₃LaSi₆ and a molecular weight of 620.06 g/mol. This compound features lanthanum in a +3 oxidation state, coordinated with three N,N-bis(trimethylsilyl)amide ligands. Typically appearing as a white to off-white powder with a purity of 98%+, verified by titration, it is highly sensitive to air and moisture and should be stored in an inert atmosphere to maintain stability.
Applications in Organic and Inorganic Synthesis
Tris[N,N-bis(trimethylsilyl)amide]lanthanum is widely used as a precursor in lanthanum-based material synthesis and as a reagent in organometallic chemistry. Its structure, containing stable N,N-bis(trimethylsilyl)amide ligands, makes it a valuable component in metal-organic chemical vapor deposition (MOCVD) processes for thin film applications, especially in electronic and semiconductor industries. Its reactivity and the presence of lanthanum provide effective control over reactions requiring lanthanide elements, making it ideal for advanced material development.
Precautions for Safe Storage and Handling
Classified under hazard codes H228-2, H261-2, H314, and H318, Tris[N,N-bis(trimethylsilyl)amide]lanthanum is flammable, water-reactive, and potentially irritating. Storage under an inert gas, such as nitrogen or argon, is recommended to prevent exposure to air or moisture. During handling, protective equipment, including gloves, eye protection, and flame-resistant clothing, should be used to prevent contact or inhalation, particularly in ventilated areas.
Industrial and Laboratory Applications
In industrial and research settings, this compound is vital for creating lanthanum-containing materials and catalysts. It is often applied in high-tech manufacturing processes for semiconductors, where precise lanthanum deposition enhances the functionality of electronic components. Its structural stability and reactivity make it crucial for developing novel materials and performing specialized catalytic reactions in both material science and electronics.
Tris[N-N-bis(trimethylsilyl)amide]lanthanum(III) is an organo-metallic compounds. See links below
Ereztech manufactures and sells this product in small and bulk volumes. Glass ampules, bottles or metal ampules, or bubblers are available for packaging. For additional analytical information or details about purchasing LA8999 contact us at sales@ereztech.com
Safety information
UN | 3396 |
Hazardous class | 4.3 (4.1) |
Packing group | II |
Pictograms | |
Signal word | DANGER |
Hazard statements | H228-H261-H314-H318 |
Precautionary statements | P210-P223-P231 + P232-P240-P241-P260-P264-P280-P301 + P330 + P331-P303 + P361 + P353-P304 + P340-P305 + P351 + P338-P310-P334 + P335-P363-P370 + P378 |
Transport description | Organometallic substance, solid, water- reactive, flammable (Tris[N-N- bis(trimethylsilyl)amide] Lanthanum(III)) |
In TSCA registry | No (sold for research and development usage only) |
First Aid Measures
General advice | Consult a physician. Show this safety data sheet to the doctor in attendance. Move out of the dangerous area. |
Eye contact | Rinse thoroughly with plenty of water for at least 15 minutes and consult a physician. |
Skin contact | Wash off with soap and plenty of water. Consult a physician. |
Inhalation | If breathed in, move person into the fresh air. If not breathing, give artificial respiration. Consult a physician. |
If swallowed | Do NOT induce vomiting. Never give anything by mouth to an unconscious person. Rinse mouth with water. Consult a physician. |
Certificates of Analysis (CoA)
If you don’t see the needed lot of Tris[N-N-bis(trimethylsilyl)amide]lanthanum(III) below please contact customer support at sales@ereztech.com
External identifiers for La[N(TMS)2]3
Pubchem CID | 4177234 |
IUPAC Name | bis(trimethylsilyl) azanide; lanthanum(3+) |
SMILES | C[Si](C)(C)N([La](N([Si](C)(C)C)[Si](C)(C)C)N([Si](C)(C)C)[Si](C)(C)C)[Si](C)(C)C |
InchI Identifier | InChI=1S/3C6H18NSi2.La/c3*1-8(2,3)7-9(4,5)6;/h3*1-6H3;/q3*-1;+3 |
InchI Key | ZDYNTRMQDURVDM-UHFFFAOYSA-N |
Known applications and external links
- Duo Cao, Xinhong Chenga, Li Zheng, Zhongjian Wang, Dawei Xu, Chao Xia, Lingyan Shen, Qian Wang, Yuehui Yu Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition. Journal of Vacuum Science & Technology A 33, 01A116 (2015)
- Wenyan Wan, Xinhong Chenga, Duo Cao, Li Zheng, Dawei Xu, Zhongjian Wang, Chao Xia, Lingyan Shen, Yuehui Yu Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition. Journal of Vacuum Science & Technology A 32, 01A127 (2014)
With Tris[N-N-bis(trimethylsilyl)amide]lanthanum(III) other customers often ask:
- Tris(cyclopentadienyl)lanthanum(III)
- Tris(tetramethylcyclopentadienyl)lanthanum
- Tris(isopropylcyclopentadienyl)lanthanum(III)
- 2,2,6,6-Tetramethyl-3,5-heptanedionate(III)lanthanum
Ereztech synthesizes and sells additional LA-compounds.
To purchase LA8999 contact us at sales@ereztech.com