Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)copper(II)
Synonym: Copper bis(2,2,6,6-tetramethyl-3,5-heptanedionate), Bis(2,2,6,6-tetramethylheptane-3,5-dionato)copper, Cu(TMHD)2
CAS Number 14040-05-2 | MDL Number MFCD00058920 | EC Number 626-948-0
Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)copper(II), also known as Cu(TMHD)₂ or Copper bis(2,2,6,6-tetramethyl-3,5-heptanedionate), is a copper(II) complex with the molecular formula C₂₂H₃₈CuO₄ and a molecular weight of 430.08 g/mol. In this compound, copper is in the +2 oxidation state, coordinated with two 2,2,6,6-tetramethyl-3,5-heptanedionate ligands, providing a stable structure suitable for advanced deposition techniques. Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)copper(II) typically appears as a dark violet crystalline powder with a purity of 99.5%, confirmed by titration, and a copper content of 14.60-14.90%, verified through complexometric analysis.
Applications in Organic and Inorganic Synthesis
This copper(II) compound is widely used in thin-film deposition applications, including metal-organic chemical vapor deposition (MOCVD) and atomic layer deposition (ALD). Its structure, with bulky tetramethyl-heptanedionate ligands, enables controlled reactivity, making it particularly valuable for producing high-purity copper films on substrates. This characteristic is essential in semiconductor and microelectronic manufacturing, where copper coatings are applied to enhance conductivity and performance. Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)copper(II) is also applied in catalyst development and material science research for producing specialized copper-based materials.
Precautions for Safe Storage and Handling
Although not highly hazardous, Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)copper(II) should be handled with standard safety precautions. It is classified under hazard codes H315, H319, and H335, indicating it can cause skin and eye irritation and respiratory discomfort upon exposure. Storage in a cool, dry environment is recommended, particularly in tightly sealed containers to prevent contamination. The compound has a melting point of around 198°C and sublimes at 100°C under 0.1 mmHg, requiring careful temperature control during handling to maintain its stability and avoid decomposition.
Industrial and Laboratory Applications
In industrial and laboratory settings, Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)copper(II) is essential for producing high-quality copper films and coatings. Its high purity and controlled deposition characteristics make it a preferred choice in semiconductor production, supporting the fabrication of advanced electronic components. Additionally, the compound’s stability and ease of use enable precise copper incorporation in a range of applications, advancing research in material sciences and facilitating the development of innovative technologies across multiple fields.
Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)copper(II) has been investigated for applicability to plasma-enhanced atomic layer deposition at low temperatures. See links below
Ereztech manufactures and sells this product in small and bulk volumes. Glass ampules, bottles or metal ampules or bubblers are available for packaging. For additional analytical information or details about purchasing Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)copper(II) contact us at sales@ereztech.com
Safety information
| UN | Not regulated |
| Hazardous class | Not regulated |
| Packing group | Not regulated |
| Pictograms |  |
| Signal word | WARNING |
| Hazard statements | H315-H319-H335 |
| Precautionary statements | P261-P264-P271-P280 |
| In TSCA registry | No (sold for research and development usage only) |
First Aid Measures
| General advice | Consult a physician. Show this safety data sheet to the doctor in attendance. Move out of the dangerous area. |
| Eye contact | Rinse thoroughly with plenty of water for at least 15 minutes and consult a physician. |
| Skin contact | Wash off with soap and plenty of water. Consult a physician. |
| Inhalation | If breathed in, move person into the fresh air. If not breathing, give artificial respiration. Consult a physician. |
| If swallowed | Do NOT induce vomiting. Never give anything by mouth to an unconscious person. Rinse mouth with water. Consult a physician. |
Certificates of Analysis (CoA)
If you don’t see the needed lot of Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)copper(II) below please contact customer support at sales@ereztech.com
Lot# 021/179 Lot# 007/1002 Lot# 019/306 Lot# 031/051
External identifiers for Cu(TMHD)2
| Pubchem CID | 14534779 |
| SMILES | [Cu+2].[O-]\C(=C/C(=O)C(C)(C)C)C(C)(C)C.CC(C)(C)C(=O)/C=C(\[O-])C(C)(C)C |
| IUPAC Name | copper; (Z)-2,2,6,6-tetramethyl-5-oxohept-3-en-3-olate |
| InchI Identifier | InChI=1S/2C11H20O2.Cu/c2*1-10(2,3)8(12)7-9(13)11(4,5)6;/h2*7,12H,1-6H3;/q;;+2/p-2/b2*8-7-; |
| InchI Key | VCIKJQZFNVXWPF-ATMONBRVSA-L |
Known applications and external links
- Christopher Jezewski W. A. Lanford, Christopher J. Wiegand, J. P. Singh, Pei-I Wang Jay J. Senkevich and Toh-Ming Lu Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces. Journal of The Electrochemical Society
- Antti Niskanen Radical Enhanced Atomic Layer Deposition of Metals and Oxides
With Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)copper(II) other customers often ask:
- Hydrido(triphenylphosphino)copper(I) hexamer
- Bis(dimethylamino-2-propoxy)copper(II)
- Bis(N,N’-di-sec-butylacetamidinato)dicopper(I)
Ereztech synthesizes and sells additional CU-compounds.
To purchase Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)copper(II) contact us at sales@ereztech.com
