2,2,6,6-Tetramethyl-3,5-heptanedionate yttrium(III)

Synonym:  Yttrium(III) Tris(2,2,6,6-tetramethyl-3,5-heptanedionate), Yttrium tris(dipivaloylmethanate), Tris(2, 2, 6, 6-tetramethyl-3, 5-heptanedionato)yttrium(III), Y(TMHD)₃

CAS Number 15632-39-0 | MDL Number MFCD00015713 | EC Number 623-259-7

Product code	Y2390
CAS number	15632-39-0
Assay (purity)	98%+
Metal purity	99.9%-Y
Purity method	by titration: % Y = 13.6 – 14.2 % (complexometric)
Molecular weight	638.71 g/mol
Melting point	170-173 °C (338-343 °F)
Boiling point	290 °C (554 °F)
Form	solid
Appearance	white powder or crystals
Sensitivity	moisture, heat, direct sunlight
Molecular formula	YC33H57O6
Linear formula	Y[OCC(CH3)3CHCOC(CH3)3]3
Packaging	glassware/metal containers/bubblers

2,2,6,6-Tetramethyl-3,5-heptanedionate yttrium(III) is conventional precursor for the growth of Y-containing high temperature superconductor layers by MOCVD and electroluminescent Y₂O₃. This product was applied as a precursor of MOCVD of Y-containing multi-component oxide thin films. Thin films of Y₂O₃ were deposited on Si(1 0 0) by radical-enhanced atomic layer deposition (ALD), using Y(TMHD)₃ and O radicals. The results demonstrate that radical-enhanced ALD is a viable technique for conformal low-temperature deposition of stoichiometric and smooth metal oxide thin films with minimal carbon contamination. See links below

Ereztech manufactures and sells this product in small and bulk volumes. Glass ampules, bottles or metal ampules or bubblers are available for packaging. For additional analytical information or details about purchasing Y2390 contact us at sales@ereztech.com

Safety information

UN	Not regulated
Hazardous class	Not regulated
Packing group	Not regulated
Pictograms
Signal word	WARNING
Hazard statements	H302-H312-H315-H319-H332-H335
Precautionary statements	P261-P264 + P265-P270-P271-P280-P301 + P317-P302 + P352-P304 + P340-P305 + P351 + P338-P317-P330-P332 + P317-P337 + P317-P362 + P364
Transport description	NONH for all modes of transport
In TSCA registry	No (research and development usage only)

First Aid Measures

General advice	Consult a physician. Show this safety data sheet to the doctor in attendance. Move out of the dangerous area.
Eye contact	Rinse thoroughly with plenty of water for at least 15 minutes and consult a physician.
Skin contact	Wash off with soap and plenty of water. Consult a physician.
Inhalation	If breathed in, move person into the fresh air. If not breathing, give artificial respiration. Consult a physician.
If swallowed	Do NOT induce vomiting. Never give anything by mouth to an unconscious person. Rinse mouth with water. Consult a physician.

 

Certificates of Analysis (CoA)

If you don’t see the needed lot of 2,2,6,6-Tetramethyl-3,5-heptanedionate yttrium(III) below please contact customer support at sales@ereztech.com

Lot# 022/006 Lot# 031/151 Lot# 019/331

External identifiers for Y(TMHD)₃

Pubchem CID	5829704
IUPAC Name	(Z)-5-hydroxy-2,2,6,6-tetramethylhept-4-en-3-one;yttrium
SMILES	CC(C)(C)C(=CC(=O)C(C)(C)C)O.CC(C)(C)C(=CC(=O)C(C)(C)C)O.CC(C)(C)C(=CC(=O)C(C)(C)C)O.[Y]
InchI Identifier	InChI=1S/3C11H20O2.Y/c3*1-10(2,3)8(12)7-9(13)11(4,5)6;/h3*7,12H,1-6H3;/b3*8-7-;
InchI Key	IAYLRLKRHZVTOP-LWTKGLMZSA-N

Known applications and external links

• G.A. Hirata, J. McKittrick, M. Avalos-Borja, J.M. Siqueros, D. Devlin, Appl. Surf. Sci, 1997, 113/114, 509-514
• Trinh Tu Van, Jane P.Chang Radical-enhanced atomic layer deposition of Y2O3 via a β-diketonate precursor and O radicals
• Trinh T.Van, Jane P.Chang Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides

With 2,2,6,6-Tetramethyl-3,5-heptanedionate yttrium(III) other customers often ask:

• Yttrium(III) chloride anhydrous (III)
• Tris(ethylcyclopentadienyl)yttrium(III)
• Tris(methylcyclopentadienyl)yttrium(III)
• Tris(n-butylcyclopentadienyl)yttrium(III)

Ereztech synthesizes and sells additional Y-compounds.

To purchase Y2390 contact us at sales@ereztech.com