Bis(dimethylamino-2-propoxy)copper(II)
Synonym: Bis[1-(dimethylamino)-2-propanolato]copper, Cu(dmap)2
CAS Number 185827-91-2 | MDL Number MFCD17014025 | EC Number 663-073-3
Bis(dimethylamino-2-propoxy)copper(II) is an ALD/CVD precursor for the preparation of Cu, Cu2O, or Cu2S films for electronic applications at temperatures ranging from 135 to 170°C. See links below
Ereztech manufactures and sells this product in small and bulk volumes. Glass ampules, bottles or metal ampules or bubblers are available for packaging. For additional analytical information or details about purchasing Bis(dimethylamino-2-propoxy)copper(II) contact us at sales@ereztech.com
Safety information
UN | Not regulated |
Hazardous class | Not applicable |
Packing group | Not applicable |
Pictograms | |
Signal word | WARNING |
Hazard statements | H315-H319-H335 |
Precautionary statements | P231-P222-P305+P351+P338-P403+P233-P422-P501 |
Transport description | NONH for all modes of transport |
In TSCA registry | No (sold for research and development usage only) |
First Aid Measures
General advice | Consult a physician. Show this safety data sheet to the doctor in attendance. Move out of the dangerous area. |
Eye contact | Rinse thoroughly with plenty of water for at least 15 minutes and consult a physician. |
Skin contact | Wash off with soap and plenty of water. Consult a physician. |
Inhalation | If breathed in, move person into the fresh air. If not breathing, give artificial respiration. Consult a physician. |
If swallowed | Do NOT induce vomiting. Never give anything by mouth to an unconscious person. Rinse mouth with water. Consult a physician. |
Certificates of Analysis (CoA)
If you don’t see the needed lot of Bis(dimethylamino-2-propoxy)copper(II) below please contact customer support at sales@ereztech.com
Lot# 003/482 Lot# 003/393 Lot# 003/494
External identifiers for Cu(dmap)2
Pubchem CID | 121234236 |
SMILES | CCC(N(C)C)[O-].CCC(N(C)C)[O-].[Cu+2] |
IUPAC Name | copper; 1-(dimethylamino)propan-1-olate |
InchI Identifier | InChI=1S/2C5H12NO.Cu/c2*1-4-5(7)6(2)3;/h2*5H,4H2,1-3H3;/q2*-1;+2 |
InchI Key | AZOFWQDMTKZNMJ-UHFFFAOYSA-N |
Known applications and external links
- Sabrina Fadloun, Dean Stephens, Patrice Gergaud, Elisabeth Blanquet, Thierry Mourier, Chris Jones, Steve Burgess, and Amit Rastogi (2018) MOCVD Copper Metallization for High Aspect Ratios TSV 3D Integration. International Symposium on Microelectronics: Fall 2018, Vol. 2018, No. 1, pp. 000718-000727.
- Yunsoo KimChang Gyoun KimTaek-Mo ChungSun Sook LeeKi-Seok AnTaek Seung YangHong Suk Jang Volatile copper aminoalkoxide complex and deposition of copper thin film using same
- Jeong Hwan Han, Yoon Jang Chung, Seong Keun Kim, Bo Keun Park, Hyo-Suk Kim, Chang Gyoun Kim, Taek-Mo Chung Growth of p-Type Tin(II) Monoxide Thin Films by Atomic Layer Deposition from Bis(1-dimethylamino-2-methyl-2propoxy)tin and H2O
With Bis(dimethylamino-2-propoxy)copper(II) other customers often ask:
- Hydrido(triphenylphosphino)copper(I) hexamer
- Bis(N,N’-di-sec-butylacetamidinato)dicopper(I)
- 2,2,6,6-Tetramethyl-3,5-heptanedionate(II)copper
Ereztech synthesizes and sells additional CU-compounds.
To purchase Bis(dimethylamino-2-propoxy)copper(II) contact us at sales@ereztech.com