Tris(i-propylcyclopentadienyl)yttrium(III)
Synonym: Yttrium tris(isopropylcyclopentadienyl), Y(iPrCp)3
CAS Number 130206-63-2 | EC Number 810-761-8
Tris(isopropylcyclopentadienyl)yttrium(III), also known as Yttrium tris(isopropylcyclopentadienyl) or Y(iPrCp)₃, is an organometallic compound with the molecular formula (C₃H₇C₅H₄)₃Y and a molecular weight of 410.43 g/mol. This compound features yttrium in the +3 oxidation state coordinated with three isopropylcyclopentadienyl ligands, creating a stable, air-sensitive structure suitable for high-precision applications. Tris(isopropylcyclopentadienyl)yttrium typically appears as yellow crystals or powder with a purity level of 98%+, verified by titration, and is highly sensitive to both air and moisture, necessitating storage under inert conditions.
Applications in Organic and Inorganic Synthesis
This yttrium compound plays an essential role in material sciences and advanced chemical synthesis, especially in processes that require yttrium-based catalysts. Its specific coordination and structure make it highly effective in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes. These deposition techniques are essential in the microelectronics and semiconductor industries, where the compound’s properties enable the formation of uniform yttrium-based films. Additionally, Y(iPrCp)₃ is employed in research settings for developing specialized yttrium-containing compounds and advanced catalysts.
Precautions for Safe Storage and Handling
Tris[(1,2,3,4,5-η)-1-(1-methylethyl)-2,4-cyclopentadien-1-yl]yttrium is classified as a water-reactive and flammable material. Due to its sensitivity to air and moisture, handling should occur in a controlled, inert atmosphere, with storage in airtight containers to maintain stability. Although not classified under specific hazard codes for severe health risks, general laboratory safety measures, including gloves, eye protection, and proper ventilation, are advised when handling this compound to avoid any reactive exposure.
Industrial and Laboratory Applications
In both industrial and laboratory contexts, Yttrium tris(isopropylcyclopentadienyl) is crucial in thin-film deposition applications, notably within the semiconductor field. Its high purity and stable reactivity support the consistent development of thin yttrium films, which are instrumental in the performance enhancement of high-tech devices. By allowing precise control over deposition layers, this compound facilitates advancements in microelectronic fabrication and is increasingly vital in the research and production of innovative yttrium-containing materials.
Tris(isopropylcyclopentadienyl)yttrium has been applied as a precursor for the growth of yttrium sesquioxide (Y2O3) thin films (ca. 2µm thickness) on a glass substrate by MOCVD, using Ar as carrier gas and CO2/H2 mixture as oxidant, with mole fractions of Y(iPrCp)3 7.5 X10~4 and CO2 ~1×10-2, respectively. A novel atomic layer deposition (ALD) route of Y2O3 thin films was developed and demonstrated utilizing Y(iPrCp)3 and O3. The ALD growth characteristics were investigated by varying precursor dosage, reactor temperature, and a number of deposition cycles. The resulting films were analyzed with spectral ellipsometry and x-ray photoelectron spectroscopy, in order to determine stoichiometry, impurity, annealing behavior, and refractive index. The results of this work demonstrate the potential for suggesting Y(iPrCp)3 as a suitable ALD precursor and Ar+ beam as an effective means of removing surface Y(OH)3 on Y2O3 films. See links below
Ereztech manufactures and sells this product in small and bulk volumes. Glass ampules, bottles or metal ampules or bubblers are available for packaging. For additional analytical information or details about purchasing Y6632 contact us at sales@ereztech.com
Safety information
| UN | 3396 |
| Hazardous class | 4.3(4.1) |
| Packing group | II |
| Pictograms |   |
| Signal word | DANGER |
| Hazard statements | H228-H261-H315-H319-H335 |
| Precautionary statements | P210-P223-P231 + P232-P240-P241-P261-P264-P271-P280-P302 + P352-P304 + P340-P305 + P351 + P338-P312-P332 + P313-P334 + P335-P337 + P313-P362-P370 + P378 |
| Transport description | Organometallic substance, solid, water-reactive, flammable Tris(i- propylcyclopentadienyl )yttrium(III) |
| In TSCA registry | No (research and development usage only) |
First Aid Measures
| General advice | Consult a physician. Show this safety data sheet to the doctor in attendance. Move out of the dangerous area. |
| Eye contact | Rinse thoroughly with plenty of water for at least 15 minutes and consult a physician. |
| Skin contact | Wash off with soap and plenty of water. Consult a physician. |
| Inhalation | If breathed in, move person into the fresh air. If not breathing, give artificial respiration. Consult a physician. |
| If swallowed | Do NOT induce vomiting. Never give anything by mouth to an unconscious person. Rinse mouth with water. Consult a physician. |
Certificates of Analysis (CoA)
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External identifiers for Y(iPrCp)3
| Pubchem CID | 131697940 |
| IUPAC Name | 2-propan-2-ylcyclopenta-1,3-diene;yttrium(3+) |
| SMILES | CC(C)C1=C[CH-]C=C1.CC(C)C1=C[CH-]C=C1.CC(C)C1=C[CH-]C=C1.[Y+3] |
| InchI Identifier | InChI=1S/3C8H11.Y/c3*1-7(2)8-5-3-4-6-8;/h3*3-7H,1-2H3;/q3*-1;+3 |
| InchI Key | PXSCYPBSTUVKDV-UHFFFAOYSA-N |
Known applications and external links
- Runshen Xu, Sathees Kannan Selvaraj, Nasim Azimi, Christos G. Takoudis Growth Characteristics and Properties of Yttrium Oxide Thin Films by Atomic Layer Deposition from Novel Y(iPrCp)3 Precursor and O3
- Ahmet Erbil, « Chemical vapor deposition of group IIIB metals », Patent number: US4882206, Filing date: 22 Jun 1988, Issue date: 21 Nov 1989
With Tris(i-propylcyclopentadienyl)yttrium(III) other customers often ask:
- Yttrium(III) chloride anhydrous (III)
- Tris(ethylcyclopentadienyl)yttrium(III)
- Tris(methylcyclopentadienyl)yttrium(III)
- Tris(n-butylcyclopentadienyl)yttrium(III)
Ereztech synthesizes and sells additional Y-compounds.
To purchase Y6632 contact us at sales@ereztech.com
