Bis(methyl-η5-cyclopentadienyl)methoxymethylzirconium
Synonym: ZRCMMM, ZrD-CO4
CAS Number 916597-01-8 | MDL Number MFCD16875687
Bis(methyl-η5-cyclopentadienyl)methoxymethylzirconium is used as a precursor for the Atomic Layer Deposition of ZrO2 thin films. See links below
Ereztech manufactures and sells this product in small and bulk volumes. Glass ampules, bottles or metal ampules or bubblers are available for packaging. For additional analytical information or details about purchasing ZR7018 contact us at sales@ereztech.com
Safety information
| UN | Not regulated |
| Hazardous class | Not regulated |
| Packing group | Not regulated |
| Pictograms |  |
| Signal word | WARNING |
| Hazard statements | H302-H315-H319 |
| Precautionary statements | P264-P270-P280-P301 + P310-P302 + P352-P305 + P351 + P338-P330-P332 + P313-P337 + P313-P362 |
| Transport description | Organometallic substance, liquid, water-reactive, flammable (Tris(diethylamido)(tert- butylimido) tantalum(V) |
| In TSCA registry | No (research and development usage only) |
First Aid Measures
| General advice | Consult a physician. Show this safety data sheet to the doctor in attendance. Move out of the dangerous area. |
| Eye contact | Rinse thoroughly with plenty of water for at least 15 minutes and consult a physician. |
| Skin contact | Wash off with soap and plenty of water. Consult a physician. |
| Inhalation | If breathed in, move person into the fresh air. If not breathing, give artificial respiration. Consult a physician. |
| If swallowed | Do NOT induce vomiting. Never give anything by mouth to an unconscious person. Rinse mouth with water. Consult a physician. |
Certificates of Analysis (CoA)
If you don’t see the needed lot of Bis(methyl-η5-cyclopentadienyl)methoxymethylzirconium below please contact customer support at sales@ereztech.com
External identifiers for ZRCMMM
| Pubchem CID | 11748461 |
| IUPAC Name | carbanide;cyclopentane;propan-1-ol;zirconium(2+) |
| SMILES | [CH3-].CC[CH-]O.[CH]1[CH][CH][CH][CH]1.[CH]1[CH][CH][CH][CH]1.[Zr+2] |
| InchI Identifier | InChI=1S/2C5H5.C3H7O.CH3.Zr/c2*1-2-4-5-3-1;1-2-3-4;;/h2*1-5H;3-4H,2H2,1H3;1H3;/q;;2*-1;+2 |
| InchI Key | LRWJSBOVKBMWCR-UHFFFAOYSA-N |
Known applications and external links
- Charles Dezelah, Jaakko Niinistö, Frans Munnik, Kaupo Kukli, Jun Lu, Mikko Ritala, Markku Leskelä, Lauri Niinistö The Atomic Layer Deposition of HfO2 and ZrO2 using Advanced Metallocene Precursors and H2O as the Oxygen Source. Chemical Vapor Deposition 14(11‐12):358 – 365 · November 2008
- Éamon O’Connor, Mattia Halter , Felix Eltes, Marilyne Sousa, Andrew Kellock, Stefan Abel, Jean Fompeyrine Stabilization of ferroelectric HfxZr1−xO2 films using a millisecond flash lamp annealing technique. APL Materials 6(12)
With Bis(methyl-η5-cyclopentadienyl)methoxymethylzirconium other customers often ask:
- Pentamethylcyclopentadienylzirconium trichloride
- Bis(cyclopentadienyl)zirconium dichloride
- Zirconium(IV)isopropoxide
- Zirconium tetrakis(2,2,6,6-tetramethyl- 3,5-heptanedionate)
Ereztech synthesizes and sells additional ZR-compounds.
To purchase ZR7018 contact us at sales@ereztech.com
